Processes and simulation for advanced integrated circuit metallization

dc.contributor.authorDew, Steven K.
dc.date.accessioned2025-05-29T03:35:30Z
dc.date.available2025-05-29T03:35:30Z
dc.date.issued1992
dc.identifier.doihttps://doi.org/10.7939/R3QZ22V19
dc.language.isoen
dc.rightsThis thesis is made available by the University of Alberta Libraries with permission of the copyright owner solely for non-commercial purposes. This thesis, or any portion thereof, may not otherwise be copied or reproduced without the written consent of the copyright owner, except to the extent permitted by Canadian copyright law.
dc.titleProcesses and simulation for advanced integrated circuit metallization
dc.typehttp://purl.org/coar/resource_type/c_46ec
thesis.degree.grantorUniversity of Alberta
thesis.degree.levelDoctoral
thesis.degree.nameDoctor of Philosophy
ual.date.graduation1992
ual.departmentDepartment of Electrical Engineering
ual.jupiterAccesshttp://terms.library.ualberta.ca/public

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