Thin film iron silicides

dc.contributor.authorSnell, David.
dc.date.accessioned2025-05-29T01:41:30Z
dc.date.available2025-05-29T01:41:30Z
dc.date.issued1992
dc.identifier.doihttps://doi.org/10.7939/R3FJ29H70
dc.language.isoen
dc.rightsThis thesis is made available by the University of Alberta Libraries with permission of the copyright owner solely for non-commercial purposes. This thesis, or any portion thereof, may not otherwise be copied or reproduced without the written consent of the copyright owner, except to the extent permitted by Canadian copyright law.
dc.titleThin film iron silicides
dc.typehttp://purl.org/coar/resource_type/c_46ec
thesis.degree.grantorhttp://id.loc.gov/authorities/names/n79058482
thesis.degree.levelMaster's
thesis.degree.nameMaster of Science
ual.date.graduation1992
ual.departmentDepartment of Electrical Engineering
ual.jupiterAccesshttp://terms.library.ualberta.ca/public

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